Semrock 滤光片 FF835-SDi01-t3-25x36
835 nm BrightLine® multiphoton 3P short-pass super-resolution / TIRF dichroic beamsplitter
| Innovative short pass dichroic beamsplitter optimized for 3-photon laser excitation in a standard epi-fluorescence microscope configuration with reflected excitation and transmitted emission.
The 2-photon (Red) and 3-photon (Green & Red) excitation regions are ideal for femtosecond pulsed lasers such as Ti:Sapphire, OPO or OPA coupled, and neodymium- and ytterbium-doped lasers, enabling deep tissue imaging with improved contrast. This multiphoton dichroic has low reflected GDD that helps minimize temporal pulse broadening of reflected 1300 nm and 1700 nm laser pulses, and very high and flat reflection and transmission bands. Semrock's Super-resolution / TIRF dichroics are available in two thicknesses and deliver industry-leading flatness for minimal focus shift and optical wavefront aberrations of the laser beam spot to enable popular imaging and super-resolution techniques such as TIRF, PALM, STORM, structured illumination, STED, and multiphoton imaging.
2.5λ P-V RWE on 1 mm, optimized for reflecting laser beams up to 6 mm in diameter while minimizing RWE |
|
曲线ASC II 参数：measured 类型：Transmission 下载FF835-SDi01-t3-25x36数据： TXT Spectrum data Semrock网站链接：FF835-SDi01-t3-25x36 |
| 型号 | 尺寸 | *未税价格 |
| FF835-SDi01-t3-25x36 | 25.2 mm x 35.6 mm x 3.0 mm | $1225.00 |
* 说明：价格为未包含增值税，关税及运费之价格。
通用规格
| 参数 | 值 |
| size | 25.2 mm x 35.6 mm x 3.0 mm |
| shape | rectangular |
| mounted | false |
| substrate.type | low-autofluorescence optical quality glass |
| scratch-dig | 60-40 |
BrightLineLaserReflDi.Quadband系列参数
| 参数 | 值 |
| tavg-and-passband-range.1 | Tavg > 90% 400 – 820 nm |
| tavg-and-passband-range.2 | Tavg > 80% 400 – 420 nm (Rolling Window: 10 nm) |
| tavg-and-passband-range.3 | Tavg > 90% 420 – 820 nm (Rolling Window: 10 nm) |
| edgewl.1 | 835 nm |
| ravg-and-passband-range.1 | Ravg > 94% 1200 – 1350 nm |
| ravg-and-passband-range.1(p-pol) | Ravg > 90% 1200 – 1350 nm |
| ravg-and-passband-range.1(s-pol) | Ravg > 98% 1200 – 1350 nm |
| ravg-and-passband-range.2 | Ravg > 94% 1600 – 1870 nm |
| ravg-and-passband-range.2(p-pol) | Ravg > 90% 1600 – 1870 nm |
| ravg-and-passband-range.2(s-pol) | Ravg > 98% 1600 – 1870 nm |
| laserwls.1 | 1200 - 1350 nm |
| laserwls.2 | 1600 - 1870 nm |
| aoi | 45 ± 1.5 degrees |
| cha | 2 degrees |
| Optical.Damage.Rating | 1 J/cm² @ 532 nm (10 ns pulse width) |
| Effective.Index | 1.87 Understanding ‘Effective Index of Refraction’ neff |
| GDD | ± 1500 fs² over 1200 - 1350 nm reflection band for S-Pol and P-Pol |
| GDD.2 | ± 750 fs² over 1600 - 1870 nm reflection band for S-Pol and P-Pol |
| Flatness.RWE | Super-resolution / TIRF |
| RWE.1 | < 2.5λ P-V RWE @ 632.8 nm |
| RWE.3 | < 0.33λ P-V RWE @ 632.8 nm |
| MaxBeamDia.1 | 6 mm |
| MaxBeamDia.3 | 16.7 mm |
| Transverse.Dimensions.(LxW) | 25.2 mm x 35.6 mm |
| Transverse.Tolerance.(mounted) | ± 0.1 mm |
| Filter.Thickness.1.(unmounted) | 1.05 mm |
| Filter.Thickness.Tolerance.1.(unmounted) | ± 0.05 mm |
| Filter.Thickness.3.(unmounted) | 3.0 mm |
| Filter.Thickness.Tolerance.3.(unmounted) | ± 0.1 mm |
| Clear.Aperture | ≥ 80% (elliptical) |
| Substrate.Type | Fused Silica |
| Substrate Thickness (1 mm, unmounted) | 1.05 mm |
| Substrate Thickness Tolerance (1 mm, unmounted) | ± 0.05 mm |
| Substrate Thickness (3 mm, unmounted) | 3.0 mm |
| Substrate Thickness Tolerance (3 mm, unmounted) | ± 0.1 mm |
| Orientation | Reflective surface marked with laser dot - Orient in direction of incoming light |