Semrock 滤光片 FF850-Di01-t1-25x36
850 nm BrightLine® Multiphoton LaserMUX™ Beam Combiner
| Multiphoton LaserMUX™ beam combiners enable deeper tissue imaging and improved contrast in multi-color and multi-modal fluorescence microscopy. The filters set new performance standards by simultaneously achieving high transmission, high reflection, and low GDD over both reflection & transmission, while maintaining minimal wavefront distortion. Ideal for combining two femtosecond pulsed laser beams, they are perfect for optogenetics and other life science applications.
Combine two or more femtosecond pulsed lasers such as Ti:Sapphire (& OPO coupled), neodymium and ytterbium-doped fiber and glass lasers, and Cr-forsterite lasers.
< 1λ P-V RWE on 1 mm, optimized for reflecting laser beams up to 10 mm in diameter while minimizing RWE |
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曲线ASC II 参数：measured 类型：Transmission 下载FF850-Di01-t1-25x36数据： TXT Spectrum data Semrock网站链接：FF850-Di01-t1-25x36 |
| 型号 | 尺寸 | *未税价格 |
| FF850-Di01-t1-25x36 | 25.2 mm x 35.6 mm x 1.1 mm | $750.00 |
* 说明：价格为未包含增值税，关税及运费之价格。
通用规格
| 参数 | 值 |
| size | 25.2 mm x 35.6 mm x 1.1 mm |
| shape | rectangular |
| mounted | false |
| substrate.type | low-autofluorescence optical quality glass |
| scratch-dig | 60-40 |
BrightLineDichroic.Singleband系列参数
| 参数 | 值 |
| rabs-and-passband-range.1 | Ravg > 95% 670 – 815 nm over any 10 nm window |
| rabs-and-passband-range.1(p-pol) | Ravg > 90% 670 – 815 nm |
| rabs-and-passband-range.1(s-pol) | Ravg > 98% 670 – 849 nm |
| tavg-and-passband-range.1 | Tavg > 93% 890 – 2100 nm over any 10 nm window |
| wavelength-range(p-pol) | Tavg > 95% 845 – 2100 nm |
| wavelength-range(s-pol) | Tavg > 90% 890 – 2100 nm |
| aoi | 45 ± 1.5 degrees |
| cha | 1.5 degrees |
| Optical.Damage.Rating | 50 mJ/cm² @ 800 nm (50 fs pulse width); test pending; specification based on FS01 Mirror test results |
| Flatness.1 | 1λ P-V RWE @ 632.8 nm |
| TWE | λ/10 PV over CA @ 632.8 nm |
| Effective.Index | 1.7 Understanding ‘Effective Index of Refraction’ neff |
| GDD-Reflection(p-pol) | ± 100 fs² over 691 - 795 nm ± 500 fs² over 683 - 812 nm |
| GDD-Reflection(s-pol) | ± 100 fs² over 670 - 828 nm ± 500 fs² over 670 - 840 nm |
| GDD-Transmisson(p-pol) | ± 100 fs² over 917 - 2050 nm (excluding substrate, by design) ± 500 fs² over 873 - 2100 nm (excluding substrate, by design) |
| GDD-Transmisson(s-pol) | ± 100 fs² over 965 - 2050 nm (excluding substrate, by design) ± 500 fs² over 913 - 2100 nm (excluding substrate, by design) |
| Transverse.Dimensions.(LxW) | 25.2 mm x 35.6 mm |
| Transverse.Tolerance.(mounted) | ± 0.1 mm |
| Filter.Thickness.1.(unmounted) | 1.05 mm |
| Filter.Thickness.Tolerance.1.(unmounted) | ± 0.05 mm |
| Clear.Aperture | ≥ 85% (elliptical) |
| Substrate Thickness (1 mm, unmounted) | 1.05 mm |
| Substrate Thickness Tolerance (1 mm, unmounted) | ± 0.05 mm |
| Flatness.RWE | Super-resolution / TIRF |
| RWE.1 | < 1λ P-V RWE @ 632.8 nm |